The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2020
Filed:
Mar. 20, 2018
Raytheon Company, Waltham, MA (US);
Allen Hainline, Rowlett, TX (US);
Richard W. Ely, Lewisville, TX (US);
Ratheon Company, Waltham, MA (US);
Abstract
A method can include determining, based on elevation data of a geographic region corresponding to a location at which an image was captured and a solar elevation angle at a time the image was captured, whether each pixel of the image is a shadow or a non-shadow to create a shadow mask of the image, generating an eroded shadow mask that includes the shadow mask with a specified number of pixels from a perimeter of each shadow in the shadow mask changed to respective values corresponding to non-shadows, generating a dilated shadow mask that includes the specified number of pixels in the shadow mask changed to values corresponding to shadows, and refining the shadow mask using the eroded shadow mask and the dilated shadow mask to create a refined shadow mask.