The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2020
Filed:
Jan. 24, 2019
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Inventors:
Assignee:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/075 (2006.01); H01L 21/027 (2006.01); C08G 77/48 (2006.01); C07C 381/12 (2006.01); H01L 29/66 (2006.01); H01L 21/311 (2006.01); H01L 21/768 (2006.01); H01L 21/3213 (2006.01); H01L 29/51 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0046 (2013.01); C07C 381/12 (2013.01); C08G 77/48 (2013.01); G03F 7/0045 (2013.01); G03F 7/0392 (2013.01); G03F 7/0751 (2013.01); G03F 7/0758 (2013.01); H01L 21/0273 (2013.01); H01L 21/31144 (2013.01); H01L 21/32139 (2013.01); H01L 21/7684 (2013.01); H01L 21/76802 (2013.01); H01L 21/76843 (2013.01); H01L 21/76877 (2013.01); H01L 29/66545 (2013.01); H01L 29/66636 (2013.01); H01L 29/66795 (2013.01); H01L 29/513 (2013.01); H01L 29/518 (2013.01); H01L 29/665 (2013.01);
Abstract
A photoresist composition includes a photoresist polymer including a repeating unit to which a silicon-containing leaving group is combined, a photo-fluorine generator including a sulfonium fluoride, and a solvent.