The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2020

Filed:

Jul. 02, 2018
Applicant:

Arkray, Inc., Kyoto, JP;

Inventors:

Kojiro Honma, Kyoto, JP;

Kentaro Kiriyama, Kyoto, JP;

Hirofumi Yamada, Kyoto, JP;

Assignee:

ARKRAY, Inc., Kyoto, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 3/30 (2006.01); G01N 21/73 (2006.01); G01N 1/28 (2006.01);
U.S. Cl.
CPC ...
G01N 21/73 (2013.01); G01N 1/28 (2013.01); G01N 2001/2893 (2013.01);
Abstract

The disclosure provides plasma spectroscopy analysis methods using a preparatory process of adding a control metal species that is different from an analyte metal species to a sample so as to have a known concentration; a concentration process of introducing the sample to a measurement container, and applying an electric current across a pair of electrodes disposed in the measurement container to concentrate the analyte metal species and the control metal species in the sample in a vicinity of at least one of the electrodes; a detection process; a correction process; and a quantification process.


Find Patent Forward Citations

Honma, Kojiro. (2020). Plasma spectroscopy analysis method (U.S. Patent No. 10551323). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10551323

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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