The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2020
Filed:
Mar. 14, 2017
Applicant:
Eastman Kodak Company, Rochester, NY (US);
Inventor:
Todd Mathew Spath, Hilton, NY (US);
Assignee:
EASTMAN KODAK COMPANY, Rochester, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/46 (2006.01); C23C 16/54 (2006.01); C23C 16/458 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
C23C 16/46 (2013.01); C23C 16/4401 (2013.01); C23C 16/4583 (2013.01); C23C 16/45551 (2013.01); C23C 16/45574 (2013.01); C23C 16/45578 (2013.01); C23C 16/545 (2013.01);
Abstract
A gas-levitated substrate backing system includes a gas-levitating backer structure which is used for providing a non-contact force onto a surface of a substrate. The gas-levitating backer structure has an output face including three or more output openings. A gas source provides a gas flow through the output openings to levitate the gas-levitating backer structure over the surface of the substrate. The gas-levitating backer structure is freely moveable in a direction normal to the surface of the substrate.