The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2020
Filed:
Oct. 04, 2017
Fina Technology, Inc., Houston, TX (US);
Giovanni Trimino, Houston, TX (US);
Carlos DeAnda, Houston, TX (US);
David W Knoeppel, League City, TX (US);
FINA TECHNOLOGY, INC., Houston, TX (US);
Abstract
High impact polystyrene may be formed with increased swell index and reduced or eliminated discoloration. A process of forming high impact polystyrene may include providing a polymerization system including a polymerization reactor and a devolatilizer. High impact polystyrene may be formed in the polymerization reactor, and sent to the devolatilizer. A polar antioxidant having a hindered phenol structure and an aliphatic amine group, and with a phosphite antioxidant may be added to the polymerization system. In another process, a chemical retarder and a fluorescent whitening agent may be added to the polymerization system. In another process, a chemical retarder that inhibits free radical rubber crosslinking may be added to the polymerization system.