The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2020
Filed:
Jan. 10, 2018
International Business Machines Corporation, Armonk, NY (US);
Joel P. de Souza, Putam Valley, NY (US);
Ning Li, White Plains, NY (US);
Devendra Sadana, Pleasantville, NY (US);
Yao Yao, Poughkeepsie, NY (US);
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Abstract
Embodiments of the invention are directed to a method of forming a semiconductor device. A non-limiting example of the method includes forming a semiconductor material that includes a first type of majority carrier. A doping enhancement layer is formed over a region of the semiconductor material, wherein the doping enhancement layer includes a first type of material. A dopant is accelerated sufficiently to drive the dopant through the doping enhancement layer into the region of the semiconductor material. Accelerating the dopant through the doping enhancement layer also drives some of the first type of material from the doping enhancement layer into the region of the semiconductor material. The dopant within the region and the first type of material within the region contribute to the region having a second type of majority carrier.