The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 28, 2020

Filed:

Jan. 09, 2018
Applicant:

Omnivision Technologies, Inc., Santa Clara, CA (US);

Inventors:

Fanbo Deng, Singapore, SG;

Chengming Liu, Fremont, CA (US);

Sarvesh Swami, San Jose, CA (US);

Assignee:

OmniVision Technologies, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/38 (2006.01); G06T 5/00 (2006.01); H04N 5/235 (2006.01); H04N 1/407 (2006.01); H04N 5/341 (2011.01);
U.S. Cl.
CPC ...
G06T 5/009 (2013.01); H04N 1/407 (2013.01); H04N 5/2355 (2013.01); H04N 5/341 (2013.01); G06T 2207/20208 (2013.01);
Abstract

A method for determining exposure levels of an image-sensor pixel array includes (a) storing a first plurality of pixel values representing a first captured image, captured with the image sensor in an applied exposure configuration, each distinct region of the pixel array having a respective first exposure level, (b) determining pixel-value global statistics, (c) estimating, from the global statistics, a global pixel value of the first captured image, (d) determining, for each distinct region, a respective local statistics of the first pixel values, (e) assigning, to each distinct region, a respective scale factor based on the local statistics of the distinct region, (f) determining a refined exposure configuration including, for each distinct region, a second exposure level proportional to a product of its respective first exposure level and its respective scale factor, and (g) capturing second pixel values with the image sensor configured in the refined exposure configuration.


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