The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 28, 2020

Filed:

May. 22, 2017
Applicant:

Sap SE, Walldorf, DE;

Inventors:

Juchang Lee, Seoul, KR;

Chang Gyoo Park, Seoul, KR;

Hyejeong Lee, Seoul, KR;

Kyu Hwan Kim, Seoul, KR;

Mihnea Andrei, Issy les Moulineaux, FR;

Assignee:

SAP SE, Walldorf, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 16/00 (2019.01); G06F 16/27 (2019.01); G06F 16/21 (2019.01); G06F 16/23 (2019.01); G06F 16/2455 (2019.01); G06F 11/36 (2006.01);
U.S. Cl.
CPC ...
G06F 16/273 (2019.01); G06F 11/36 (2013.01); G06F 16/219 (2019.01); G06F 16/2358 (2019.01); G06F 16/2379 (2019.01); G06F 16/2455 (2019.01);
Abstract

An oldest version timestamp is received from a first database. A current commit timestamp is received from a second database configured to asynchronously replicate the first database. The current global commit timestamp corresponds to a commit transaction executed in the first database and subsequently replicated in the second database. A first test query is then issued to the second database including a request for a current timestamp of the second database. A second test query is issued to the primary database requesting records associated with a target update version that has a target timestamp equal to the current snapshot timestamp. A determination is then made that a first return associated with the first test query and a second return associated with the second test query are identical indicating a successful validation. Related apparatus, systems, techniques and articles are also described.


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