The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2020
Filed:
Aug. 23, 2016
Leica Instruments (Singapore) Pte. Ltd., Singapore, SG;
Manfred Kuster, Widnau, CH;
Michael Guentert, Heerbrugg, CH;
Leica Instruments (Singapore) Pte. Ltd., Singapore, SG;
Abstract
An illumination and observation system (), in particular for an ophthalmic microscope, comprises a first observation pupil () and a second observation pupil () for the eyes of an observer such as an assistant. Further, the system comprises a coaxial illumination () in the first observation pupil () and a main illumination (), the coaxial illumination () being adapted to generate a red reflex () in the observed eye in operation and the main illumination having a larger field of illumination than the coaxial illumination (). To facilitate usage of the system () and/or the microscope () and to create a superior stereoscopic view using the red reflex (), a control subsystem () is provided which is adapted to automatically adjust an intensity of the main illumination () depending on a change in an intensity of the coaxial illumination ().