The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 28, 2020

Filed:

Nov. 14, 2016
Applicant:

Sysmex Corporation, Kobe-shi, JP;

Inventors:

Junzo Yamamoto, Kobe, JP;

Shigeo Kanamori, Kobe, JP;

Fumio Inoue, Kobe, JP;

Ikuya Takenaka, Kobe, JP;

Osamu Hirota, Kobe, JP;

Assignee:

SYSMEX CORPORATION, Kobe, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 35/00 (2006.01); G16H 40/40 (2018.01); G16H 10/40 (2018.01);
U.S. Cl.
CPC ...
G01N 35/00623 (2013.01); G01N 35/00722 (2013.01); G01N 35/00871 (2013.01); G16H 10/40 (2018.01); G16H 40/40 (2018.01);
Abstract

A managing method for a sample processing apparatus involving the sample processing apparatus and a management apparatus. The method includes requesting an approval of self-adjustment to the management apparatus from the sample processing apparatus before performing a self-adjustment. Informing the sample processing apparatus of approval of request from the management apparatus, when approving the sample processing apparatus to perform the self-adjustment, and performing a self-adjustment by the sample processing apparatus when the sample processing apparatus is informed that the request has been approved.


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