The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2020
Filed:
Mar. 30, 2016
Applicant:
Air Liquide Advanced Materials, Llc, Branchburg, PA (US);
Inventors:
Sean Kerrigan, Princeton, NJ (US);
Antonio Sanchez, Tsukuba, JP;
Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/34 (2006.01); C23C 16/455 (2006.01); C23C 16/50 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/345 (2013.01); C23C 16/45525 (2013.01); C23C 16/50 (2013.01); H01L 21/0217 (2013.01); H01L 21/0228 (2013.01); H01L 21/02222 (2013.01); H01L 21/02274 (2013.01);
Abstract
Methods for forming a SiN-containing film are disclosed. The methods use film-forming compositions comprising Si—N containing precursors. Also disclosed are methods of synthesizing the same and methods of using the same for vapor deposition. In particular, a catalytic dehydrogenative coupling of carbosilanes with ammonia, amines and amidines produces the Si—N containing precursors.