The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2020
Filed:
Jun. 04, 2018
Seiko Epson Corporation, Tokyo, JP;
Kenji Fukasawa, Nagano, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
A profile adjustment method is a method of adjusting a profile defining a correspondent relation between input coordinate values of an input color space and output coordinate values of an output color space. The profile adjustment method includes: accepting setting of a first adjustment point of first coordinates and a second adjustment point of second coordinates; setting a third adjustment point of third coordinates based on the first and second coordinates; generating third adjustment data indicating degree of adjustment at the third adjustment point based on first adjustment data indicating degree of adjustment at the first adjustment point and second adjustment data indicating degree of adjustment at the second adjustment point; and adjusting the profile based on the first adjustment data, the second adjustment data, and the third adjustment data.