The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2020
Filed:
Mar. 17, 2017
Lyten, Inc., Sunnyvale, CA (US);
Richard White, Huntington, GB;
LYTEN, INC., Sunnyvale, CA (US);
Abstract
A method comprising: depositing a quantum dot solution onto an as-grown layer of channel material to form a layer of quantum dot material having a substantially uniform thickness across the area of the layer of quantum dot material; and transferring the layers of channel and quantum dot material as a single stack onto a substrate comprising source and drain electrodes such that both the layers of channel and quantum dot material substantially conform to the topography of the underlying substrate and electrodes whilst maintaining the substantially uniform thickness of quantum dot material, the source and drain electrodes configured to enable a flow of electrical current through the layer of channel material, the layer of quantum dot material configured to generate electron-hole pairs on exposure to incident electromagnetic radiation to produce a detectable change in the flow of electrical current which is indicative of one or more of the presence and magnitude of the incident electromagnetic radiation.