The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2020
Filed:
May. 31, 2017
Composition for forming organic anti-reflective coating layer suitable for negative tone development
Applicant:
Dongjin Semichem Co., Ltd., Incheon, KR;
Inventors:
Hyo Jung Roh, Hwaseong-si, KR;
Ji Hyun Kim, Hwaseong-si, KR;
Seung Jin Kim, Hwaseong-si, KR;
Hyun Jin Kim, Hwaseong-si, KR;
Assignee:
DONGJIN SEMICHEM CO., LTD., Incheon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 5/00 (2006.01); G02B 1/111 (2015.01); G03F 7/09 (2006.01); B05D 3/02 (2006.01); B05D 5/00 (2006.01); C09D 125/18 (2006.01); G03F 7/038 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/091 (2013.01); B05D 3/0272 (2013.01); B05D 5/00 (2013.01); C09D 5/006 (2013.01); C09D 125/18 (2013.01); G02B 1/111 (2013.01); G03F 7/038 (2013.01); G03F 7/168 (2013.01);
Abstract
Provided is a composition for forming an organic anti-reflective coating layer used in a negative tone development, which not only enhance an adhesion to a photoresist while having a high refractive index and a high etch rate but also improve a pattern profile of undercut etc. The composition an isocyanurate compound containing at least one moiety which is represented by Formula 2; a polymer represented by Formula 3 and an organic solvent for dissolving the above-mentioned components.