The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2020

Filed:

Dec. 11, 2015
Applicant:

Phc Holdings Corporation, Tokyo, JP;

Inventors:

Fusatoshi Okamoto, Ehime, JP;

Masahiro Johno, Ehime, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 35/00 (2006.01); G01N 35/08 (2006.01); G01N 37/00 (2006.01);
U.S. Cl.
CPC ...
G01N 35/00069 (2013.01); G01N 35/00584 (2013.01); G01N 35/08 (2013.01); G01N 37/00 (2013.01); G01N 2035/00495 (2013.01);
Abstract

A substrate for sample analysis including: a substrate including a rotation axis; a first chamber, which includes a first space which retains the liquid; a second chamber, which includes a second space which retains the liquid discharged from the first chamber; and a first flow passage, which includes a path connecting the first chamber and the second chamber in which the first flow passage has a first opening and a second opening, the first opening and the second opening are connected to the first chamber and the second chamber, respectively, and the first opening is positioned on a side closer to the rotation axis than the second opening, in which the first space includes a first region, which includes a portion extending from the first opening and in which the first space of the first chamber has a capacity larger than a capacity of the first flow passage.


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