The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2020
Filed:
Sep. 13, 2017
Bruker Hts Gmbh, Hanau, DE;
Alexander Usoskin, Hanau, DE;
Thomas Schneider, Frankfurt am Main, DE;
BRUKER HTS GMBH, Hanau, DE;
Abstract
A method for depositing film on a substrate () through pulsed laser deposition, which includes: generating at least two pulsed laser beams () with at least one laser (), and directing the at least two laser beams () to different target spots () of a target (), whereby the target () is ablated and at least two plasma plumes () are created. The plasma plumes () create a flow of target material towards the substrate () and the target material is deposited onto the substrate () at a deposition area (). The plasma plumes () created by the at least two laser beams () are spatially and temporally superimposed, and the target spots () are separated from each other at a distance that allows a gas-dynamical interaction of the created plasma plumes ().