The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2020
Filed:
Jul. 03, 2018
Shenzhen University, Shenzhen, Guangdong, CN;
Shaojun Chen, Guangdong, CN;
Haitao Zhuo, Guangdong, CN;
Lijun Lai, Guangdong, CN;
Jinghao Yang, Guangdong, CN;
SHENZHEN UNIVERSITY, Shenzhen, CN;
Abstract
The present invention is applicable to the field of polymer material preparation, and provides a method for preparing polymer hollow microspheres, the steps are as follows: mixing a styrene-based monomer A, an acrylic monomer B, and an acrylate monomer C with a initiator, and reacting to prepare a seed emulsion; maintaining the temperature of the seed emulsion unchanged, mixing the styrene-based monomer A, the monomer C, and a sulfur-containing acrylic monomer D with the initiator, continuously dripping to the seed emulsion, to obtain a product; adding alkaline solution to the product, then adding acid solution, and finally neutralizing, to obtain hollow microspheres.