The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2020

Filed:

Aug. 30, 2018
Applicant:

Nanya Technology Corporation, New Taipei, TW;

Inventors:

Da-Zen Chuang, Taipei, TW;

Sheng-Tsung Chen, New Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/108 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
H01L 27/10805 (2013.01); H01L 21/0337 (2013.01); H01L 27/10855 (2013.01);
Abstract

The present disclosure provides a DRAM cell structure. The DRAM cell structure includes a substrate, a gate structure disposed in the substrate, a first source/drain region and a second source/drain region disposed in the substrate respectively at two sides of the gate structure, a landing pad disposed over the second source/drain region, a plurality of conductive pillars disposed on the landing pad, a conductive layer disposed over the plurality of conductive pillars, and a dielectric layer disposed between the conductive layer and the plurality of conductive pillars. The plurality of conductive pillars have at least a first width and a second width, and the first width and the second width are different from each other.


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