The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2020
Filed:
Aug. 09, 2018
Hitachi Metals, Ltd., Minato-ku, Tokyo, JP;
Ryan Johnson, Fort Collins, CO (US);
Alexei V. Smirnov, Fort Collins, CO (US);
Patrick Albright, Wellington, CO (US);
Cy Jordan, Fort Collins, CO (US);
Arun Nagarajan, San Bruno, CA (US);
Hitachi Metals, Ltd., Tokyo, JP;
Abstract
Mass flow control systems and methods for controlling the mass flow rate of a gas through a primary conduit are disclosed. One mass flow control system includes a primary conduit for directing a flow of a gas and an adjustment system configured to divert a portion of the gas from the primary conduit to a secondary conduit and provide an adjustment signal that changes when a composition of the gas changes. A mass flow controller is operatively coupled to the primary conduit to control a primary flow rate of the gas. The mass flow controller includes a valve to control the primary flow rate of the gas and a control loop configured to receive the adjustment signal and control the valve to provide the primary flow rate of the gas at a set point.