The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2020
Filed:
Nov. 07, 2017
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventor:
Ryo Sasaki, Utsunomiya, JP;
Assignee:
CANON KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70858 (2013.01); G03F 7/70341 (2013.01);
Abstract
The present invention provides an exposure apparatus that exposes a substrate via a projection optical system, the apparatus including a supply unit including a first channel to which a first gas containing air is supplied, a second channel to which a second gas higher in oxygen concentration than the first gas is supplied, and a third channel to which a third gas lower in oxygen concentration than the first gas is supplied, and configured to generate a mixture gas by using at least two of the first gas, the second gas, and the third gas, and supply the mixture gas to a space between the substrate and the projection optical system.