The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2020

Filed:

Nov. 22, 2016
Applicant:

V Technology Co., Ltd., Yokohama-shi, Kanagawa, JP;

Inventors:

Michinobu Mizumura, Yokohama, JP;

Shuji Kudo, Yokohama, JP;

Koichi Kajiyama, Yokohama, JP;

Assignee:

V TECHNOLOGY CO., LTD., Yokohama-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2006.01); C23C 14/08 (2006.01); C23C 14/34 (2006.01); C25D 3/12 (2006.01); C25D 5/02 (2006.01); C25D 5/14 (2006.01); G06F 3/041 (2006.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); C23C 14/086 (2013.01); C23C 14/34 (2013.01); C25D 3/12 (2013.01); C25D 5/022 (2013.01); C25D 5/14 (2013.01); G06F 3/041 (2013.01); G06F 2203/04103 (2013.01);
Abstract

The present invention provides a deposition mask including: a mask layer having an aperture pattern that is formed in conformity with a transparent electrode to be formed on a display surface of a display panel, with the same shape and size as the transparent electrode; and a support layer having plural support lines formed on one surface of the mask layer across the aperture pattern. In the mask, an arrangement pitch for the support lines of the support layer is set so as to reduce moire fringes or diffraction fringes that appear due to shadows of the support lines, which are transferred onto the transparent electrode as unevenness in deposition thickness.


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