The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2020
Filed:
Nov. 02, 2017
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Rahul Ghosh, Bangalore, IN;
Hugh E. Hockett, Raleigh, NC (US);
Aaron J. Quirk, Raleigh, NC (US);
Lin Sun, Cary, NC (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 9/455 (2018.01); G06F 9/445 (2018.01); H04L 29/08 (2006.01); G06F 9/44 (2018.01); H04L 12/24 (2006.01); G06F 8/61 (2018.01); G06F 8/10 (2018.01); G06F 8/20 (2018.01); G06F 8/71 (2018.01);
U.S. Cl.
CPC ...
H04L 67/10 (2013.01); G06F 8/63 (2013.01); H04L 67/02 (2013.01); G06F 8/10 (2013.01); G06F 8/20 (2013.01); G06F 8/71 (2013.01);
Abstract
A method is provided for building patterns with high level pattern topology requirements for deployment across multiple systems. The patterns are built based on pattern capabilities and configurations of the multiple systems. Such patterns can meet the desired pattern capabilities including high availability and/or continuous capabilities.