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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10529975 B1

PDFFull Text
Date of Patent:
Jan. 07, 2020

Filed:

Jul. 31, 2015

Nanoscale sofc electrode architecture engineered using atomic layer deposition

Applicant:

West Virginia University, Morgantown, WV (US);

Inventors:

Xueyan Song, Morgantown, WV (US);

Yun Chen, Morgantown, WV (US);

Kirk Gerdes, Morgantown, WV (US);

Shiwoo Lee, Morgantown, WV (US);

Assignee:

West Virginia University, Morgantown, WV (US);

Attorney:

Thomas|Horstemeyer, LLP

Primary Examiner:

Jonathan Crepeau

Assistant Examiner:

Angela J Martin

Int. Cl.
CPC ...
H01M 4/04 (2006.01); H01M 4/86 (2006.01); H01M 4/88 (2006.01); H01M 8/12 (2016.01); H01M 8/1213 (2016.01); H01M 8/1246 (2016.01); H01M 8/124 (2016.01);
U.S. Cl.
CPC ...
H01M 4/0428 (2013.01); H01M 4/8626 (2013.01); H01M 4/8878 (2013.01); H01M 8/1213 (2013.01); H01M 8/1246 (2013.01); H01M 2008/1293 (2013.01); H01M 2300/0074 (2013.01); Y02E 60/525 (2013.01); Y02P 70/56 (2015.11);
Abstract

One embodiment includes forming surface-modifying phases on a surface of a functional electrode via atomic layer deposition and controlling the chemistry of constituent phases, the crystalline nature of the constituent phases and the thickness of the surface-modifying phase via the atomic layer deposition such that the thickness is between about 2 nm to about 200 nm. The surface-modifying phases enhances the performance of electrocatalytic activity of the functional electrode and the device.

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Song, Xueyan. (2020). Nanoscale sofc electrode architecture engineered using atomic layer deposition (U.S. Patent No. 10529975). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10529975

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