The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2020
Filed:
Mar. 30, 2018
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Gal Bitan, Petach Tikva, IL;
Haim Azaria, Netanya, IL;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, Gyeonggi-Do, KR;
Abstract
A method for calculating disparity in a pair of images includes receiving a first image of a scene and designating the first image as a master image. A second image of the scene is received, and the second image is designated as a slave image. The master image is binarized to produce a binarized master image. The slave image is binarized to produce a binarized slave image. A matching cost associated with matching each pixel within the binarized master image with a corresponding set of candidate pixels within the binarized slave image is calculated. A probability density function is created based on the calculated matching costs associated with each pixel within the binarized master image. The created probability density function is used to produce a disparity for the master image and the slave image and to produce a confidence for the produced disparity.