The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2020
Filed:
Dec. 05, 2017
Fujifilm Corporation, Tokyo, JP;
Daisuke Hara, Ashigarakami-gun, JP;
Hiroshige Nakamura, Ashigarakami-gun, JP;
Kensuke Katagiri, Ashigarakami-gun, JP;
Masaya Nakayama, Ashigarakami-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A method of designing a mesh pattern includes: a first step of tightly disposing a plurality of polygons having an arbitrary shape in an area to form a transparent active area; a second step of obtaining a circumcenter of each of the polygons; a third step of disposing one arbitrary point in each of the polygons to be positioned at a distance, which is less than ½ a radius of a circumscribed circle of the polygon, from the circumcenter; a fourth step of forming a pattern to form second cells by connecting two arbitrary points corresponding to two polygons that share each of sides of the polygons; and a fifth step of forming a pattern to form first cells using the polygons, in which the polygons having a random shape are disposed in the first step, and/or the arbitrary point is randomly disposed in the third step.