The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2020

Filed:

Jun. 23, 2016
Applicant:

Shenzhen China Star Optoelectronics Technology Co., Ltd., Shenzhen, Guangdong, CN;

Inventors:

Wen Dai, Guangdong, CN;

Peng Du, Guangdong, CN;

Jianjian Ying, Guangdong, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1337 (2006.01); G03F 7/20 (2006.01); G03F 1/50 (2012.01);
U.S. Cl.
CPC ...
G03F 7/70466 (2013.01); G02F 1/133753 (2013.01); G02F 1/133788 (2013.01); G03F 1/50 (2013.01); G03F 7/201 (2013.01); G03F 7/2032 (2013.01);
Abstract

The disclosure discloses a method for exposing a transparent substrate, including: fixing relative positions of a first mask, a second mask and the transparent substrate; exposing various regions of the transparent substrate by light with different polarization directions generated by the first mask and the second mask respectively. By the method above, the disclosure can simplify the process, reduce the period and improve efficiency of production.


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