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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10527933 B1

PDFFull Text
Date of Patent:
Jan. 07, 2020

Filed:

Oct. 31, 2018

Imprint lithography method, master template for imprint, wire grid polarizer manufactured using the master template and display substrate having the same

Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Seung-Won Park, Seoul, KR;

Taewoo Kim, Seoul, KR;

Lei Xie, Suwon-si, KR;

Daehwan Jang, Seoul, KR;

Dae-Young Lee, Seoul, KR;

Gugrae Jo, Asan-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:

H.C. Park & Associates, PLC

Primary Examiner:

Yasser A Abdelaziez

Int. Cl.
CPC ...
G03F 7/00 (2006.01); G02F 1/00 (2006.01); G02B 5/30 (2006.01); G02F 1/1335 (2006.01); G03F 1/60 (2012.01); G03F 1/80 (2012.01); H01L 27/12 (2006.01); G02B 5/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); G02B 5/00 (2013.01); G02B 5/3058 (2013.01); G02F 1/00 (2013.01); G02F 1/133528 (2013.01); G03F 1/60 (2013.01); G03F 1/80 (2013.01); H01L 27/124 (2013.01); H01L 27/1218 (2013.01); H01L 27/1259 (2013.01); G02F 2001/133548 (2013.01);
Abstract

A wire grid polarizer includes a base substrate, a wire grid pattern, a first stitch line extending in a first direction, and a second stitch line extending in a second direction which crosses the first direction, and including a first portion and a second portion which are discontinuous from each other, in which the wire grid pattern is evenly formed on all of the base substrate except where the first and second stitch lines exist, and the first and second stitch lines are where the wire grid pattern is unevenly formed.

Find Patent Forward Citations

Quick Actions:

Park, Seung-Won. (2020). Imprint lithography method, master template for imprint, wire grid polarizer manufactured using the master template and display substrate having the same (U.S. Patent No. 10527933). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10527933

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