The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2020
Filed:
Nov. 06, 2018
Magic Leap, Inc., Plantation, FL (US);
Shuqiang Yang, Austin, TX (US);
Vikramjit Singh, Pflugerville, TX (US);
Kang Luo, Austin, TX (US);
Nai-Wen Pi, Plano, TX (US);
Frank Y. Xu, Austin, TX (US);
Magic Leap, Inc., Plantation, FL (US);
Abstract
A method of fabricating a diffractive structure with varying diffractive element depth includes providing a shadow mask having a first region with a first aperture dimension to aperture periodicity ratio and a second region with a second aperture dimension to aperture periodicity ratio less than the first aperture dimension to aperture periodicity ratio. The method also includes positioning the shadow mask adjacent a substrate. The substrate comprises an etch mask corresponding to the diffractive structure. The method further includes exposing the substrate to an etchant, etching the substrate to form diffractive elements adjacent the first region having a first depth, and etching the substrate to form diffractive elements adjacent the second region having a second depth less than the first depth.