The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2020

Filed:

Aug. 22, 2016
Applicant:

Mitsubishi Electric Corporation, Tokyo, JP;

Inventors:

Hitomi Ono, Tokyo, JP;

Jiro Suzuki, Tokyo, JP;

Yoshichika Miwa, Tokyo, JP;

Toshiyuki Ando, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 9/00 (2006.01); G01M 11/02 (2006.01);
U.S. Cl.
CPC ...
G01M 11/0257 (2013.01); G01J 9/00 (2013.01); G01M 11/02 (2013.01); G01M 11/0207 (2013.01);
Abstract

A light source system () illuminating an optical system to be inspected () and making light fluxes of a plurality of wavefront measurement visual fields be emitted from the optical system to be inspected; a single wavefront sensor () calculating wavefront aberration on a basis of measurement of the light fluxes of the plurality of wavefront measurement visual fields emitted from the optical system to be inspected (); and an optical path optical system () are included. The optical path optical system selectively makes the light fluxes of the plurality of wavefront measurement visual fields emitted from the optical system to be inspected () be incident on the wavefront sensor ().


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