The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2020
Filed:
Jan. 17, 2017
Ichikawa Co., Ltd., Bunkyo-ku, JP;
Yasuyuki Ogiwara, Bunkyo-ku, JP;
Ichikawa Co., Ltd., Bunkyo-ku, JP;
Abstract
The object is to provide a base fabric for a papermaking felt wherein there is no damage to the MD yarns of the seam loops and a method of producing the same. This is achieved by a base fabric for a papermaking felt wherein seam loops are formed by MD yarns, which is made from MD yarns of the felt running direction (MD) and CD yarns of the felt cross-direction (CD); wherein the seam loops are obtained by removing CD yarns from a part other than the CD yarn no-removal part of a woven fabric comprising a seam loop region having the CD yarn no-removal part, and by moving CD yarns of the CD yarn no-removal part and CD yarns from between the CD yarn no-removal part and the part in which the CD yarns have been removed in the direction of the part in which the CD yarns have been removed, and wherein the strength of the MD yarns of the part in which the CD yarns have been removed is lower than the strength of the MD yarns of the CD yarn no-removal part.