The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2020
Filed:
Mar. 18, 2016
Showa Denko K.k., Tokyo, JP;
Masashi Nakabayashi, Tokyo, JP;
Kiyoshi Kojima, Osato-Gun, JP;
Hiroyuki Deai, Osato-Gun, JP;
Kota Shimomura, Osato-Gun, JP;
Yukio Nagahata, Osato-Gun, JP;
SHOWA DENKO K.K., Tokyo, JP;
Abstract
The present invention provides a method of manufacturing by the sublimation-recrystallization method more accurately detecting a thermal state of a starting material in a crucible and enabling control of the growth conditions while manufacturing an SiC single crystal. The method obtains the high frequency current to be supplied through the induction coil by a converter for converting AC current to DC current and an inverter means for converting the DC current output from the converter to a high frequency to obtain a high frequency current, obtains a grasp, in advance, of a relationship between a variation over time of a DC equivalent resistivity (DCV/DCI), calculated from a DC voltage value (DCV) and DC current value (DCI) converted by the converter at the time of growth of the silicon carbide single crystal, and a density of micropipes formed in the grown silicon carbide single crystal, and adjusts at least one of the DCV or DCI at the converter based on the relationship of the DC equivalent resistivity and micropipe density grasped in advance.