The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2020
Filed:
Oct. 03, 2017
Hamilton Sundstrand Corporation, Charlotte, NC (US);
Qingqing Zhang, Shanghai, CN;
Yanzhi Chen, Shanghai, CN;
Ranadip Acharya, Rocky Hill, CT (US);
Tahany Ibrahim El-Wardany, Bloomfield, CT (US);
Vijay Narayan Jagdale, South Windsor, CT (US);
Changle Li, Shanghai, CN;
Colette Opsahl Fennessy, West Hartford, CT (US);
HAMILTON SUNDSTRAND CORPORATION, Charlotte, NC (US);
Abstract
An additive manufacturing (AM) system comprising a process distortion compensation computing system configured to determine a digital nominal model that represents a physical target object excluding a distortion, and a digital distortion model that represents the physical target object including at least one distortion. The AM system further comprises an AM peripheral device configured to form a three-dimensional physical object based on a digital compensation model. The process distortion compensation computing system determines a material volume difference between the digital nominal model and the digital distortion model, and generates the digital compensation model that compensates for the material volume difference.