The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2020
Filed:
Mar. 19, 2014
Applicant:
Wacker Chemie Ag, Munich, DE;
Inventors:
Friedrich Popp, Ooltewah, TN (US);
Christian Kutza, Burghausen, DE;
Martin Roeckl, Rosenheim, DE;
Tobias Weiss, Mehring, DE;
Assignee:
Wacker Chemie AG, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 4/00 (2006.01); B01J 19/00 (2006.01); B01J 19/24 (2006.01); B05B 1/00 (2006.01); B05B 1/14 (2006.01); B05B 1/20 (2006.01); C01B 33/00 (2006.01); C01B 33/02 (2006.01); C01B 33/021 (2006.01); C01B 33/027 (2006.01); C01B 33/035 (2006.01);
U.S. Cl.
CPC ...
B01J 4/002 (2013.01); B05B 1/207 (2013.01); C01B 33/035 (2013.01);
Abstract
A gas distribution system for a polysilicon deposition reactor eliminates or mitigates the problems associated with prior art distribution systems employs at least two segments which are gas-tightly connected to one another by readily detachable fasteners, with at least one gas inlet opening and one gas outlet opening, the gas distributor of the system being mounted by readily detachable fasteners to the polysilicon reactor.