The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2019

Filed:

Feb. 14, 2018
Applicant:

Massachusetts Institute of Technology, Cambridge, MA (US);

Inventors:

Michael Patrick Walsh, Somerville, MA (US);

Dirk Robert Englund, Brookline, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/302 (2006.01); H01L 27/146 (2006.01); H01J 37/28 (2006.01); H01J 37/22 (2006.01); G01N 21/00 (2006.01); G02B 21/00 (2006.01); H01L 21/68 (2006.01); H01L 23/544 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); G01N 21/00 (2013.01); G02B 21/00 (2013.01); H01J 37/222 (2013.01); H01J 37/3023 (2013.01); H01L 21/68 (2013.01); H01L 23/544 (2013.01);
Abstract

A method of locating a substrate within a field of view of an imaging system includes acquiring an image of a first marker on a substrate in the field of view. The first marker has a first spatial pattern representing a position of the first marker relative to the substrate. The method also includes determining possible positions of the substrate based on the first spatial pattern and moving the substrate relative to the field of view based on the possible positions of the substrate. The method also includes acquiring an image of a second marker on the substrate in the field of view. The second marker has a second pattern representing a position of the second marker relative to the substrate. The method further includes determining the position of the substrate relative to the field of view based on the position of the second marker on the substrate.


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