The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2019

Filed:

May. 19, 2017
Applicant:

Kabushiki Kaisha Toyota Chuo Kenkyusho, Nagakute-Shi, Aichi, JP;

Inventors:

Hiroaki Wakayama, Nagoya, JP;

Hirotaka Yonekura, Nagoya, JP;

Yasuaki Kawai, Nagoya, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01F 1/03 (2006.01); H01F 1/057 (2006.01); H01F 41/02 (2006.01); H01F 1/06 (2006.01); H01F 1/055 (2006.01); H01F 1/08 (2006.01);
U.S. Cl.
CPC ...
H01F 1/0306 (2013.01); H01F 1/0579 (2013.01); H01F 41/0266 (2013.01); H01F 1/0558 (2013.01); H01F 1/068 (2013.01); H01F 1/083 (2013.01); Y10T 428/12 (2015.01); Y10T 428/24802 (2015.01); Y10T 428/24942 (2015.01);
Abstract

A method for producing a nanoheterostructured permanent magnet includes a first step of preparing a raw material solution by dissolving, in a solvent, (1) a block copolymer comprising polymer block components that are immiscible but linked to each other, (2) a first inorganic precursor which is one of a hard magnetic material precursor and a soft magnetic material precursor, and (3) a second inorganic precursor which is the other of the hard magnetic material precursor and the soft magnetic material precursor, and a second step including a phase-separation treatment for forming a nanophase-separated, a conversion treatment for converting the hard magnetic material precursor and the soft magnetic material precursor to a hard magnetic material and a soft magnetic material, respectively, and a removal treatment for removing the block copolymer from the nanophase-separated structure.


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