The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2019

Filed:

Nov. 21, 2017
Applicant:

Wuhan China Star Optoelectronics Technology Co., Ltd., Wuhan, Hubei, CN;

Inventors:

Yong Yang, Hubei, CN;

Hongqing Cui, Hubei, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/11 (2006.01); B82Y 40/00 (2011.01); H01L 21/027 (2006.01); B29C 59/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B82Y 40/00 (2013.01); G03F 7/11 (2013.01); B29C 2059/023 (2013.01); H01L 21/0271 (2013.01);
Abstract

A nanoimprint template is provided, including a main template, a plurality of photoresist micro-structures arranged on the main template, and a fluororubber polymer layer coated on an outer layer of the photoresist micro-structures. The fluororubber polymer layer has a bonding function with the main template, so as to fixedly connect to the surface of the main template. The nanoimprint template can not only protect the photoresist microstructure therein, but also prevent the nanoimprint template from being deformed during operating, thereby improving the process quality. Moreover, the surface oil resistance and corrosion resistance of the nanoimprint template is improved, so that the surface has lower surface energy, which can effectively improve the degumming problem during operating. A manufacturing method of the nanoimprint template and the application thereof in manufacturing a microstructure substrate are also provided, the microstructure size and shape of the formed microstructure substrate can be ensured.


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