The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2019

Filed:

Aug. 03, 2016
Applicant:

Till I.d. Gmbh, Graefelfing, DE;

Inventor:

Rainer Uhl, Munich, DE;

Assignee:

TILL I.D. GMBH, Planegg/Martinsried, DE;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 21/00 (2006.01); G02B 21/16 (2006.01); G01N 21/64 (2006.01);
U.S. Cl.
CPC ...
G02B 21/0032 (2013.01); G02B 21/0044 (2013.01); G02B 21/16 (2013.01); G01N 21/6458 (2013.01); G01N 2021/6478 (2013.01);
Abstract

A system for confocal observation of a sample, having a mask, which is arranged in both an illumination beam path and in an image beam path and which is rotatable around a central axis, openings arranged in a pinhole plane, an arrangement of focusing micro-optics aligned with the geometric arrangement of the openings of the mask to generate a focal pattern, and an optical assembly with an objective, and which is configured to image the focal pattern onto the sample for generating an illumination pattern moving across the sample and to collect light from the sample by the objective and to image it onto the openings of the mask for confocal filtering. The focal plane and pinhole plane are separated by a distance and the optical assembly has a path length difference compensation arrangement which is selective with regard to the illumination light and the light collected from the sample.


Find Patent Forward Citations

Loading…