The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2019
Filed:
Sep. 11, 2017
Applicant:
Fujifilm Corporation, Minato-ku, Tokyo, JP;
Inventor:
Hiroki Takahashi, Saitama, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/118 (2015.01); G02B 1/115 (2015.01); B32B 9/04 (2006.01); B32B 37/14 (2006.01);
U.S. Cl.
CPC ...
G02B 1/118 (2013.01); B32B 9/04 (2013.01); B32B 37/14 (2013.01); G02B 1/115 (2013.01); B32B 2307/418 (2013.01); B32B 2309/105 (2013.01);
Abstract
An antireflection film substrate that is provided on a surface of a substrate includes a surface layer having an alumina hydrate as a main component. The surface layer has an uneven structure in which a volume proportion of the alumina hydrate per unit volume decreases in a direction from the substrate side to a surface side, and a period of apexes distributed on the uneven structure on the surface side is configured to be equal to or less than a wavelength of light of which reflection is to be suppressed.