The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2019
Filed:
Jun. 24, 2016
Applicant:
Industry-university Cooperation Foundation Sogang University, Seoul, KR;
Inventors:
Taewook Kang, Seoul, KR;
Yuna Sin, Seoul, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/65 (2006.01); B82Y 40/00 (2011.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G01N 21/658 (2013.01); B82Y 40/00 (2013.01); G03F 7/00 (2013.01);
Abstract
By forming a monolayer of metal core-shell nanoparticles, transferring the monolayer to various substrates and removing the shells surrounding the particles by way of selective etching, it is possible to form large-area uniform nanogap structures very easily. In addition, a nanogap is formed by an ultrasmall void having no limitation in diffusion between metal cores through Van der Waals interaction between the metal core particles, as the etching proceeds. It is possible to enhance a near-field significantly around the nanogap structure.