The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2019

Filed:

Nov. 09, 2018
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Ravi Jallepally, San Ramon, CA (US);

Muhammad M. Rasheed, San Jose, CA (US);

Ilker Durukan, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/509 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
C23C 16/458 (2013.01); C23C 16/455 (2013.01); C23C 16/45502 (2013.01); C23C 16/45544 (2013.01); C23C 16/45565 (2013.01); C23C 16/50 (2013.01); C23C 16/509 (2013.01);
Abstract

Outer distribution rings and gas distribution apparatus with outer distribution rings to deliver a gas flow to a process region of a process chamber are described. The outer distribution rings include at least one plenum in fluid communication with a plurality of openings forming a plurality of trenches to allow gas to flow from the plenum through the openings and down an inner peripheral face of the outer distribution ring.


Find Patent Forward Citations

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Jallepally, Ravi. (2019). Apparatus and method for providing a uniform flow of gas (U.S. Patent No. 10519546). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10519546

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