The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2019

Filed:

Sep. 18, 2018
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventor:

Akinari Hayashi, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); H01L 21/677 (2006.01); H01L 21/673 (2006.01); H01L 21/67 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4408 (2013.01); H01L 21/67017 (2013.01); H01L 21/6732 (2013.01); H01L 21/67196 (2013.01); H01L 21/67742 (2013.01); H01L 21/67757 (2013.01); H01L 21/67778 (2013.01); H01L 21/67781 (2013.01); H01L 21/0217 (2013.01); H01L 21/02532 (2013.01); H01L 21/02595 (2013.01);
Abstract

There is provided a technique that includes: a reaction chamber that processes a substrate on a substrate support; a transfer chamber; a gate that opens and closes an opening and is formed in the transfer chamber; a transfer device; a clean unit supplying a clean atmosphere to the transfer chamber; an inert gas supplier supplying an inert gas to the transfer chamber; and a controller controlling the inert gas supplier such that, after the loading of the substrate from a substrate container to the substrate support by the transfer device is completed and the gate is closed, the inert gas supplier supplies the inert gas during a time period until the gate is opened again and does not supply the inert gas in another time period, and control the transfer chamber to be kept at a positive pressure by an air atmosphere.


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