The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2019

Filed:

Jun. 23, 2016
Applicant:

3m Innovative Properties Company, St. Paul, MN (US);

Inventors:

David B. Olson, Hudson, WI (US);

Diane North, Inver Grove Heights, MN (US);

Patricia M. Savu, Maplewood, MN (US);

Eric M. Peterson, St. Paul, MN (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 220/18 (2006.01); C09J 11/08 (2006.01); C09J 133/10 (2006.01); C09J 133/14 (2006.01); C09J 7/38 (2018.01); C08F 220/16 (2006.01); H01L 31/0216 (2014.01); B32B 7/12 (2006.01); B32B 27/08 (2006.01); H01L 31/032 (2006.01); H01L 31/0392 (2006.01);
U.S. Cl.
CPC ...
C09J 11/08 (2013.01); B32B 7/12 (2013.01); B32B 27/08 (2013.01); C08F 220/16 (2013.01); C08F 220/18 (2013.01); C09J 7/385 (2018.01); C09J 133/10 (2013.01); C09J 133/14 (2013.01); H01L 31/02167 (2013.01); C08F 2800/20 (2013.01); C09J 2203/322 (2013.01); C09J 2433/00 (2013.01); H01L 31/0322 (2013.01); H01L 31/03928 (2013.01);
Abstract

A copolymer that includes first divalent units having a pendent ultraviolet absorbing group, second divalent units represented by formula (I):, and third divalent units represented by formula (II):. Each Ris independently hydrogen or methyl; Ris a straight-chain or branched alkyl having from 1 to 20 carbon atoms; V is O or NH; W is alkylene having from 1 to 10 carbon atoms; and each R' is independently alkyl having from 1 to 6 carbon atoms. Compositions including the copolymer, for example, pressure sensitive adhesive compositions are disclosed. Articles including the compositions are disclosed. For example, an assembly including a barrier film and the pressure sensitive adhesive composition is also disclosed.


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