The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2019
Filed:
Aug. 22, 2017
Fujifilm Corporation, Tokyo, JP;
Shinichiro Sonoda, Kanagawa, JP;
Tatsuya Yoshihiro, Kanagawa, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
An antireflection film includes an uneven structure layer that has an uneven structure in which a distance between protrusions is shorter than a wavelength of light of which reflection is to be suppressed and has an alumina hydrate as a main component, and an intermediate layer that is disposed between the uneven structure layer and a substrate. The uneven structure layer has a spatial frequency peak value of the uneven structure of 6.5 μmor greater and a film thickness of 250 nm or more, and the intermediate layer is constituted of a plurality of layers including at least a first layer, a second layer, a third layer, a fourth layer, a fifth layer, a sixth layer, a seventh layer, and an eighth layer in this order from the uneven structure layer side to the substrate side.