The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 24, 2019

Filed:

Mar. 17, 2017
Applicant:

Sharp Kabushiki Kaisha, Sakai, Osaka, JP;

Inventors:

Makoto Higashikawa, Sakai, JP;

Toshihiko Sakai, Sakai, JP;

Kazuya Tsujino, Sakai, JP;

Liumin Zou, Sakai, JP;

Teruaki Higo, Sakai, JP;

Yuta Matsumoto, Sakai, JP;

Assignee:

SHARP KABUSHIKI KAISHA, Sakai, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0216 (2014.01); H01L 31/047 (2014.01); H01L 31/0224 (2006.01); H01L 31/05 (2014.01); H01L 31/02 (2006.01);
U.S. Cl.
CPC ...
H01L 31/02167 (2013.01); H01L 31/02013 (2013.01); H01L 31/02245 (2013.01); H01L 31/022425 (2013.01); H01L 31/022441 (2013.01); H01L 31/022458 (2013.01); H01L 31/047 (2014.12); H01L 31/0516 (2013.01);
Abstract

A photovoltaic conversion device () includes a semiconductor substrate (), a passivation film (), n-type amorphous semiconductor strips, p-type amorphous semiconductor strips (), and electrodes (). The passivation film () is formed on one of the surfaces of the semiconductor substrate (). The n- and p-type amorphous semiconductor strips are arranged alternately as viewed along an in-plane direction of the semiconductor substrate () (Y-axis direction). The p-type amorphous semiconductor strips () have reduced-thickness regions () at some intervals as viewed along the length direction of the p-type amorphous semiconductor strips () (X-axis direction). The n-type amorphous semiconductor strips have a similar structure. The electrodes () are provided on the p-type amorphous semiconductor strips (), but not in areas where the reduced-thickness regions () have a positive curvature r with respect to the length direction of the reduced-thickness regions (). Electrodes on the n-type amorphous semiconductor strips have a similar arrangement.


Find Patent Forward Citations

Loading…