The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 2019
Filed:
Feb. 15, 2017
Kulicke & Soffa Liteq B.v., Eindhoven, NL;
Adrianus Johannes Petrus Maria Vermeer, Eindhoven, NL;
KULICKE & SOFFA LITEQ B.V., Eindhoven, NL;
Abstract
A lithographic apparatus () and method for preventing exposure of a peripheral portion (P) of a substrate (S). An edge mask (M) has a radial concave edge (E) that extends over less than half a circle arch. The edge mask (M) is connected to a mask carrier () that circumnavigates the projection system () to adjust a tangential coordinate (Φ) and a radial coordinate (R) of the edge mask (M) with respect to the optical axis (A) of the projection system () for inserting the edge mask (M) at a variable distance into the beam of radiation (B). The tangential and radial positions (Φ,R) of the edge mask (M) are coordinated with a changing position (X,Y) of the substrate (S) to prevent exposure of the peripheral portion (P) of the substrate (S) during exposure of the target region (T).