The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 2019
Filed:
Apr. 29, 2016
Applicant:
Rohm and Haas Electronic Materials Korea Ltd., Cheonan, Chungcheongnam-Do, KR;
Inventors:
Chang-Young Hong, Chungbuk, KR;
Eui-Hyun Ryu, Gyeonggi-Do, KR;
Min-Kyung Jang, Seoul, KR;
Dong-Yong Kim, Gyeonggi-Do, KR;
Jae Yun Ahn, Busan, KR;
Assignee:
Rohm and Haas Electronic Materials Korea Ltd., Cheonan, Chungcheongnam-do, KR;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); G03F 7/039 (2006.01); G03F 7/095 (2006.01); C09D 133/06 (2006.01); C08L 37/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C09D 133/06 (2013.01); G03F 7/0397 (2013.01); G03F 7/095 (2013.01); G03F 7/2041 (2013.01); G03F 7/325 (2013.01); G03F 7/38 (2013.01);
Abstract
Topcoat compositions are provided that are suitably applied above a photoresist composition. Preferred topcoat compositions comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.