The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 2019
Filed:
Aug. 12, 2016
Applicant:
Givaudan SA, Vernier, CH;
Inventors:
Andreas Natsch, Uetikon, CH;
Michael Wasescha, Bassersdorf, CH;
Assignee:
GIVAUDAN SA, Vernier, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61K 8/40 (2006.01); A61K 8/33 (2006.01); A61K 8/37 (2006.01); A61K 8/35 (2006.01); A61K 8/368 (2006.01); A61K 31/275 (2006.01); A61K 31/05 (2006.01); A61K 8/34 (2006.01); A61Q 13/00 (2006.01); A61Q 15/00 (2006.01); A61Q 19/00 (2006.01);
U.S. Cl.
CPC ...
A61K 8/40 (2013.01); A61K 8/33 (2013.01); A61K 8/35 (2013.01); A61K 8/368 (2013.01); A61K 8/37 (2013.01); A61Q 13/00 (2013.01); A61Q 15/00 (2013.01); A61Q 19/00 (2013.01); A61K 8/347 (2013.01); A61K 31/05 (2013.01); A61K 31/275 (2013.01); A61K 2800/75 (2013.01);
Abstract
The invention relates to organic compounds having the ability to reduce or suppress the onset of skin irritation induced by extraneous cause selected from the group of 2-heptylcyclopentanone, 2-ethoxynaphthalene; 2-methoxynaphthalene; 1-methoxy-4-(prop-1-enyl)benzene; 1-(cyclopropylmethyl)-4-methoxybenzene; Furthermore the invention refers to compositions for topical application to the skin comprising them. It further relates to a method of reducing or suppressing the formation of skin irritation.