The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 17, 2019

Filed:

Oct. 20, 2017
Applicant:

Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd., Wuhan, Hubei, CN;

Inventor:

Qian Jiang, Guangdong, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/24 (2006.01); H01L 51/00 (2006.01); C23C 14/04 (2006.01); C23C 14/54 (2006.01); H01L 51/56 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0012 (2013.01); C23C 14/042 (2013.01); C23C 14/24 (2013.01); C23C 14/54 (2013.01); H01L 51/001 (2013.01); H01L 51/0011 (2013.01); H01L 51/56 (2013.01);
Abstract

The present invention discloses a commissioning method and a vapor deposition machine, the method is used for adjusting the relative position of a precision mask plate and a substrate to be operated, which comprises: loading a commissioning substrate into a vapor deposition chamber for commissioning; loading a precision mask plate into the vapor deposition chamber for commissioning; turning on the light source in the vapor deposition chamber for commissioning, and irradiating the photochromic layer on the commissioning substrate via the precision mask plate, wherein a partial position of the irradiated photochromic layer is discolored; obtaining a compensation value of the precision mask plate by the location of a partial discolored position of the photochromic layer. The method is possible to omit the organic materials during the commissioning process, and increase the commissioning speed.


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