The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 17, 2019

Filed:

Jun. 30, 2017
Applicant:

Ams Ag, Unterpremstaetten, AT;

Inventors:

Jong Mun Park, Graz, AT;

Georg Roehrer, Lebring, AT;

Assignee:

ams AG, Unterpremstaetten, AT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/08 (2006.01); H01L 29/66 (2006.01); H01L 29/423 (2006.01); H01L 29/10 (2006.01); H01L 29/49 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7816 (2013.01); H01L 29/0865 (2013.01); H01L 29/0869 (2013.01); H01L 29/0882 (2013.01); H01L 29/0886 (2013.01); H01L 29/1033 (2013.01); H01L 29/1045 (2013.01); H01L 29/4238 (2013.01); H01L 29/4983 (2013.01); H01L 29/66484 (2013.01); H01L 29/66537 (2013.01); H01L 29/66568 (2013.01); H01L 29/66681 (2013.01); H01L 29/7831 (2013.01); H01L 29/7836 (2013.01); H01L 29/0649 (2013.01); H01L 29/0653 (2013.01); H01L 29/0692 (2013.01);
Abstract

A well of a first type of conductivity is formed in a semiconductor substrate, and wells of a second type of conductivity are formed in the well of the first type of conductivity at a distance from one another. By an implantation of dopants, a doped region of the second type of conductivity is formed in the well of the first type of conductivity between the wells of the second type of conductivity and at a distance from the wells of the second type of conductivity. Source/drain contacts are applied to the wells of the second type of conductivity, and a gate dielectric and a gate electrode are arranged above regions of the well of the first type of conductivity that are located between the wells of the second type of conductivity and the doped region of the second type of conductivity.


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