The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2019
Filed:
Jun. 03, 2019
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Atashi Basu, Menlo Park, CA (US);
Abhijit Basu Mallick, Palo Alto, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01); H01L 23/48 (2006.01); H01L 23/52 (2006.01); H01L 29/40 (2006.01); H01L 21/285 (2006.01); H01L 21/321 (2006.01); H01L 21/02 (2006.01); H01L 21/32 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28562 (2013.01); H01L 21/0226 (2013.01); H01L 21/02205 (2013.01); H01L 21/02277 (2013.01); H01L 21/32 (2013.01); H01L 21/321 (2013.01);
Abstract
Methods of depositing a film selectively onto a first substrate surface relative to a second substrate surface are described. The methods include depositing a second metal on a first metal without protecting the dielectric, protecting the metal with a cross-linked self-assembled monolayer and depositing a second dielectric on the first dielectric while the metal is protected.